Vitor Riseti Manfrinato

Research Experience: Nanostructure fabrication by charged-particle-beam lithography (electron, helium ion, neon ion), and nanostructure characterization by electron microscopy (SEM, TEM, STEM) and spectroscopy (EFTEM, EELS) at the sub-10 nm scale. Investigation of the resolution limits of charged-particle-beam lithography at the sub-10 nm scale by analyzing: (1) the point-spread function (including the effects of spot size, electron scattering, electron energy, substrate, secondary electrons, volume plasmons, and resists); (2) the resist development; (3) the resist collapse; and (4) the line edge roughness. Numerical and Monte Carlo simulation of electron scattering and energy deposition in resists. Lithographic placement and fluorescence microscopy of single colloidal quantum dots (diameter < 10 nm). Fabrication of graphene nanoribbons by top-down (electron-beam lithography, helium ion milling, optical lithography) and bottom-up (nanoparticle catalytic etching) nanofabrication techniques. Raman spectroscopy, atomic force microscopy, and electrical characterization of graphene field effect transistors. Fabrication of sub-100 nm plasmonic antennas and characterization of surface and volume plasmons by electron energy loss spectroscopy (EELS). Investigation of electron- and ion-beam interactions with matter for proof of concept demonstration of interaction-free quantum electron microscopy.

Informações coletadas do Lattes em 06/09/2025

Acadêmico

Formação acadêmica

Doutorado em Engenharia Elétrica

2009 - 2015

Massachusetts Institute Of Technology
Título: -
Orientador: Karl K. Berggren
Bolsista do(a): MIT - Electrical Engineering and Computer Science Department, MIT - EECS, Estados Unidos. Palavras-chave: nanotecnologia; nanofabricação; dispositivos.Grande área: Outros

Mestrado interrompido em 2009 em Engenharia Elétrica

2009 - interrompida

Universidade de São Paulo
Título: Grafeno como Sensor de Gases (Graphene Gas Sensors),Orientador: Antonio Carlos Seabra
Ano de interrupção: 2009Grande área: EngenhariasGrande Área: Engenharias / Área: Engenharia Elétrica / Subárea: Materiais Elétricos / Especialidade: Materiais e Dispositivos Magnéticos. Grande Área: Outros / Área: Microeletrônica.

Graduação em Engenharia Elétrica

2004 - 2008

Escola Politécnica da Universidade de São Paulo
Título: Métodos de Fabricação de Nanofitas de Grafeno (Fabrication Methods of Graphene Nanoribbons)
Orientador: Jing Kong
Bolsista do(a): Roberto Rocca Education Program (Tenaris-Confab), R.R.E.P., Brasil.

Formação complementar

2008 - 2008

Extensão universitária em Visiting Student. , Massachusetts Institute of Technology, MIT, Estados Unidos.

Idiomas

Inglês

Compreende Bem, Fala Bem, Lê Bem, Escreve Bem.

Espanhol

Compreende Razoavelmente, Fala Pouco, Lê Razoavelmente, Escreve Pouco.

Francês

Compreende Razoavelmente, Fala Razoavelmente, Lê Razoavelmente, Escreve Razoavelmente.

Áreas de atuação

Grande área: Engenharias / Área: Engenharia Elétrica / Subárea: Nanoeletrônica.

Produções bibliográficas

Manfrinato, Vitor R. ; WEN, JIANGUO ; ZHANG, LIHUA ; YANG, YUJIA ; HOBBS, RICHARD G. ; BAKER, BOWEN ; SU, DONG ; ZAKHAROV, DMITRI ; ZALUZEC, NESTOR J. ; MILLER, DEAN J. ; STACH, ERIC A. ; Berggren, Karl K. . Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function. Nano Letters (Print) , v. 14, p. 4406-4412, 2014.
MANFRINATO, VITOR R ; WANGER, DARCY D ; STRASFELD, DAVID B ; HAN, HEE-SUN ; MARSILI, FRANCESCO ; ARRIETA, JOSE P ; MENTZEL, TAMAR S ; BAWENDI, MOUNGI G ; BERGGREN, KARL K . Controlled placement of colloidal quantum dots in sub-15 nm clusters. Nanotechnology (Bristol. Online) , v. 24, p. 125302, 2013.
Manfrinato, Vitor R. ; ZHANG, LIHUA ; SU, DONG ; Duan, Huigao ; HOBBS, RICHARD G. ; STACH, ERIC A. ; Berggren, Karl K. . Resolution Limits of Electron-Beam Lithography toward the Atomic Scale. Nano Letters (Print) , v. 13, p. 130321102652000, 2013.
MANFRINATO, V. R. ; Cheong, Lin Lee ; Duan, Huigao ; Winston, Donald ; Smith, Henry I. ; Berggren, Karl K. . Sub-5keV electron-beam lithography in hydrogen silsesquioxane resist. Microelectronic Engineering , v. X, p. X-X, 2011.
STROBEL, SEBASTIAN ; HARRY, KATHERINE J ; Duan, Huigao ; YANG, JOEL K W ; MANFRINATO, VITOR R ; BERGGREN, KARL K . Electrochemical development of hydrogen silsesquioxane by applying an electrical potential. Nanotechnology (Bristol. Online) , v. 22, p. 375301, 2011.
Winston, Donald ; Manfrinato, Vitor R. ; NICAISE, SAMUEL M. ; Cheong, Lin Lee ; Duan, Huigao ; FERRANTI, DAVID ; MARSHMAN, JEFF ; MCVEY, SHAWN ; STERN, LEWIS ; NOTTE, JOHN ; Berggren, Karl K. . Neon Ion Beam Lithography (NIBL). Nano Letters (Print) , v. 11, p. 4343-4347, 2011.
Duan, Huigao ; Manfrinato, Vitor R. ; Yang, Joel K. W. ; Winston, Donald ; Cord, Bryan M. ; Berggren, Karl K. . Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale. Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures Processing, Measurement and Phenomena , v. 28, p. C6H11, 2010.
Duan, Huigao ; Winston, Donald ; Yang, Joel K. W. ; Cord, Bryan M. ; Manfrinato, Vitor R. ; Berggren, Karl K. . Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist. Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures Processing, Measurement and Phenomena , v. 28, p. C6C58, 2010.
Campos, L. C. ; MANFRINATO, V. R. ; Javier D. Sanchez-Yamagishi ; Jing Kong ; Pablo Jarillo-Herrero . Anisotropic Etching and Nanoribbon Formation in Single-Layer Graphene. Nano Letters , v. 9, p. 2600-2604, 2009.

Histórico profissional

Endereço profissional

MIT - Electrical Engineering and Computer Science Department. , 50 Vassar Street, 02139 - Cambridge, - Estados Unidos

Experiência profissional

2009 - Atual

Massachusetts Institute Of Technology

Vínculo: Bolsista recém-doutor, Enquadramento Funcional: Assistente de Pesquisa, Regime: Dedicação exclusiva.

Outras informações:
Quantum Nanostructures and Nanofabrication Group (http://quantum.mit.edu)

2008 - 2008

MASSACHUSETTS INSTITUTE OF TCHNOLOGY

Vínculo: Aluno Visitante, Enquadramento Funcional: Aluno

Outras informações:
Condução de Projetos nos Seguintes Laboratórios: Nanomaterials and Electronics Group (Jing Kong Group) - www.rle.mit.edu/nmeg ; Jarillo-Herrero Group - http://web.mit.edu/jarilloherrero/index.html ; NanoStructures Laboratory (NSL)

2015 - Atual

Brookhaven National Laboratory

Vínculo: Celetista, Enquadramento Funcional: postdoc, Regime: Dedicação exclusiva.